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Description
Polymer track detectors are considered to be reliable means used in particle detection, their analysis implying a chemical etching process. The process of placing track detectors in vacuum, irradiating them for specific periods and then restoring them to normal pressure can induce damages or changes in the polymer structure. The purpose of this study is to evaluate the effect of vacuum exposure on the polymer track detectors and on the way they respond to the upcoming chemical processing. The analysis of these polymer track detectors implies a chemical etching process which is dependent on the etching time, temperature and etchant concentration. The investigation of vacuum-induced modifications was studied in terms of bulk etch rate by irradiating the PADC (Poly(allyl diglycol carbonate)) detectors with a 252Cf source for different periods of time.
